Read Anywhere and on Any Device!

Subscribe to Read | $0.00

Join today and start reading your favorite books for Free!

Create Free Account

Quick and Easy Sign Up!

It takes less then 1 minute to sign up, then you can enjoy Unlimited eBooks.

Sign Up Browse

Popular Genres

Read Anywhere and on Any Device!

  • Download on iOS
  • Download on Android
  • Download on iOS

Multivariable dynamic modeling and plasma-oriented advanced process control of nonlinear reactive sputtering: PhD Thesis

Multivariable dynamic modeling and plasma-oriented advanced process control of nonlinear reactive sputtering: PhD Thesis

Christian Wölfel
0/5 ( ratings)
Read Download
This thesis investigates the nonlinear reactive sputter process in a novel way: both from the control-theoretical side and from the plasma-physical side.
The plasma behavior is explicitly considered for the process modeling and for the design of the control system to establish steady-state plasma conditions. By use of one of the presented control systems an unstable operation point of the process can be stabilized, which enables high deposition speed and a stoichiometric thin film subject to steady-state plasma conditions. In this framework, the plasma state is either defined by the self-bias voltage or the electron density. The application of the Multipole Resonance Probe allows to control the electron density as a quantity that directly characterizes the plasma state.
Pages
340
Format
Paperback
Publisher
Books on Demand
Release
March 03, 2021
ISBN 13
9783753424842

Multivariable dynamic modeling and plasma-oriented advanced process control of nonlinear reactive sputtering: PhD Thesis

Christian Wölfel
0/5 ( ratings)
Read Download
This thesis investigates the nonlinear reactive sputter process in a novel way: both from the control-theoretical side and from the plasma-physical side.
The plasma behavior is explicitly considered for the process modeling and for the design of the control system to establish steady-state plasma conditions. By use of one of the presented control systems an unstable operation point of the process can be stabilized, which enables high deposition speed and a stoichiometric thin film subject to steady-state plasma conditions. In this framework, the plasma state is either defined by the self-bias voltage or the electron density. The application of the Multipole Resonance Probe allows to control the electron density as a quantity that directly characterizes the plasma state.
Pages
340
Format
Paperback
Publisher
Books on Demand
Release
March 03, 2021
ISBN 13
9783753424842

More books from Christian Wölfel

Design for a Sustainable Circular Economy: Research and Practice Consequences (Design Science and Innovation)

0/5 ( ratings)

Innovation durch Design

0/5 ( ratings)

Rate this book!

Write a review?

loader